Characterization of plasmas from a pulsed jet discharge with applications to VUV spectroscopy and micromechanics

摘要

Plasmas from a pulsed jet discharge have been characterized with respect to gas species and nozzle design. Spectral lines from the gas used in the pulsed jet are apparent in the visible region. The vacuum ultraviolet spectrum, in particular for gases with high Z, is dominated by emission from species sputtered from the nozzle. Although an extensive search was made for excimer emission, no evidence of such emission was found. The production of highly ionized and excited states from materials created by the sputtering of the nozzle has possible applications in VUV spectroscopy. By operating the pulsed jet discharge at a 50 Hz repetition rate with NF$\sb3$ to produce excited fluorine ions, etch rates in excess of 10 $\mu$m/min. have been achieved in silicon, which may have application to micromechanics.